MJB-3 Mask Aligner
Manufacturer: Karl Suss
The SUSS MJB 3 mask aligner is equipped with a 200 W mercury short-arc lamp housing containing a relatively simple and yet comparatively high resolution optical system. Exposure wavelength is centered at 405 nm. The aligner performs exposures in high precision mode (vacuum pulled between mask and substrate), hard contact mode (standard, nitrogen pressure under the substrate) and soft contact mode (vacuum under the substrate). Line/space resolution of 1.5 μm and alignment accuracies of 0.2 μm can be obtained under high precision mode. Mask size: 4 x 4 inch (effective exposure area is 3 inch diameter).
Cleaning Procedure: Samples to be used in the lithography equipment should be free of greases, oils, fingerprints, and particles. If necessary, samples should be cleaned in solvents, followed by DI rinse and N2 blow dry. Particular attention should be paid to the back side of the sample.
Operating Instructions
Allowed Materials
Materials: Si, Ge, C, GaAs and its compounds, InP and its compounds, cleaned SiO2 (glass), and cleaned Al2O3 (sapphire)
Prohibited Materials
Indium, tin, zinc, iron, and organics (vacuum grease, rubber, plastic)