Heidelberg MLA150
Manufacturer: Heidelberg
The Maskless Aligner MLA 150 is a state-of-the-art maskless lithography tool. Areas of application include nanofabrication of quantum devices (2D materials, semiconductor materials, nanowires, etc.) MEMS, micro-optical elements, sensors, actuators, MOEMS and other devices for materials and life sciences. Depending on the application, the MLA 150 patterns high-resolution, high aspect ratio, and even simple grayscale structures.
Highlights:
- 405 nm and 375 nm lasers - equiped with High Aspect Ratio option for thick SU-8 resists.
- Direct-write Lithography: No mask-related costs, effort, or security risks; Variable substrate size: 3 x 3 mm optical focus, 5 x 5 mm pneumatic focus and up as large as 6″ x 6″; Minimum feature size: 1.0 μm
- Accurate Alignment: front local alignment (stage alignment - 250 nm)
- Fast writing: Max. write speed of 285 mm²/min with 405 nm laser
- Exposure Quality: Edge roughness 60 nm; CD uniformity 100 nm; 40 nm address grid; autofocus compensation for warped/corrugated substrates