Corial 210IL ICP-RIE
Manufacturer: PlasmaTherm
The system features high density plasma utilizing both 600 W RIE (13.56 MHz) and 2000 W ICP (2 MHz) RF generators.
The system is equiped with a quartz liner and a variety of pucks for use from small samples up to 150 mm (6") with maintaining high etch rates and excellent uniformities (<5%).
The cathode can run between -30C and 60C with heat transfer via a backside helium control.
The system is equipmed with Optical Endpoint Spectroscopy (OES) and Spot Laser interferometer for insitu film measurement.
Gases Available: BCl3, Cl2, SF6, CF4, CHF3, O2, Ar, N2