Allwin RTP System
Manufacturer: Allwin
The AccuThermo AW610 is an atmospheric rapid thermal processing (RTP) system that uses high-intensity visible radiation to heat single wafers for short process periods of time at precisely controlled temperatures. The system is typically used for metal annealing and silicide formation in inert atmospheres (nitrogen), but is equipped with oxygen and can be used to grow oxides at high temperatures. This system is also equipped with NH3 for the formation of oxynitride Si films.
A thermocouple in contact with the sample is generally used at temperatures below 900 °C. Above this temperature, the process is controlled with a non-contact pyrometer and is capable of operating up to 1250 °C. Process times are typically 1-600 seconds in duration but can be programmed up to 9999 seconds. Small samples must be processed on a 4" carrier wafer. Large wafers up to 6" in diameter can be processed.
System gases: Ar, O2, N2, NH3, forming gas (10% H2 in Argon)