UVO Cleaner
Model 144AX produces near-atomically clean surfaces in less than one minute by utilizing the UV/ozone cleaning method. Oxygen gas is converted into ozone under the presence of an UV lamp. The resultant ozone is ion-free and will not cause surface damage like other plasma based ashing processes. This process effectively and thoroughly removes an assortment of organic contaminants from surfaces. These contaminants include human skin oils, silicone oils, solder flux, residues from wet cleaning processes or water residue, contamination absorbed during prolonged exposure to air, and many others.
Operating Instructions
Allowed Materials
Si, Ge, C, GaAs and its compounds, InP and its compounds, cleaned SiO2 (glass), and cleaned Al2O3 (sapphire)
Prohibited Materials
indium, tin, zinc, iron