Thermco Diffusion Furnace
Manufacturer: Thermco
The six-stack Thermco Furnace is used for general purpose silicon processing. Each furnace can process up to 1100 °C and can accommodate 4" wafers. Each of the furnace tubes is dedicated for a sole purpose:
- Tube 1: Device-quality gate oxides (N2, O2, and TransLC)
- Allowed Materials: Silicon wafers. Prohibited Materials: Anything else.
- Tube 2: Dry and wet oxidation (N2 and Torch (O2 and H2) available)
- Forming Gas (10% H2 in nitrogen) is available for tube 2.
- Tube 3: Metal annealing (O2 and N2)
- Tubes 4 and 5: Implant activation and general purpose oxidation (O2 and N2)
- Tube 6: Equipped with vacuum capabilities (O2 and N2)