Raith EBL
Manufacturer: Raith
The Raith EBPG5200 is a high-end, state-of-the-art electron beam lithography system that can write to less than 8 nm in size on full 200 mm wafers or small sample pieces. The system uses a high current density thermal field emission (TFM) gun for operation at 100 kV accelerating voltage. Rapid exposure is possible with up to 50 MHz write speeds and a 20-bit pattern generator. The system incorporates breakthroughs in enhanced resolution (sub-10 nm achievable), noise reduction, and beam stability for the ultimate in nano-lithography.
Cleaning procedure: Samples generally do not require special cleaning unless needed to remove prohibited materials before processing. All materials to enter the equipment will be handled with wafer tongs by an operator wearing latex, poly, or nitrile clean gloves.
Operating Instructions
Allowed Materials
Semiconductor-based materials, dielectrics, metal films, and resists
Prohibited Materials
Magnetic materials, organics, epoxy, rubbers, and plastics. Substances that can outgas/sublime/evaporate in vacuum; hydrocarbons (oil, grease, fingerprints); organic materials; and liquids of any kind