PVA Plasma Asher
Manufacturer: PVA
Photoresist stripping (ashing) has been widely used as a dry method for the removal of photoresists and other carbon based materials. The PS210 utilizes high-energy microwaves as its energy source for ion/radical formation. A faraday cage can be inserted into the system to reduce ion damage. Oxygen and nitrogen are available for high resist removal rates. The PS210 is ideal for ashing, surface cleaning, and surface modification.
Operating Instructions
Allowed Materials
Organic (PR), Si, Ge, C, GaAs and its compounds, InP and its compounds, cleaned SiO2 (glass), and cleaned Al2O3 (sapphire)
Prohibited Materials
High vapor pressure metals including: indium, lead, tin, and zinc
Magnetic materials including: iron, nickel, and cobalt