OAI Deep-UV Light Source
Manufacturer: OAI
The OAI light source is a high-performance collimated illumination system intended for UV flood exposure related applications. The system has an external timer that controls a shutter inside the light source in 0.1 second increments up to 999.9 seconds.
Cleaning Procedure: Samples to be used in the lithography equipment should be free of greases, oils, fingerprints, and particles. If necessary, samples should be cleaned in solvents, followed by DI rinse and N2 blow dry. Particular attention should be paid to the back side of the sample.
Operating Instructions
Allowed Materials
Semiconductor materials, dielectric and metal thin films, and resists
Prohibited Materials
Organics, liquids and greases of any kind