MJB-4 Mask Aligner
The MJB4 Mask Aligner is a precision instrument for high-resolution photolithography and is intended for use in research laboratories, small-series production and pilot projects. It has been designed for exposing wafers / substrates with a diameter of up to 100 mm or 4"x 4" and various thicknesses (up to 9 mm). Key hardware parameters and applications listed here:
- Resolution of ~0.5 μm is achievable under Vacuum contact mode. Soft / Hard contact modes available.
- The achievable alignment accuracy X, Y and Theta is below 1 μm.
- Mask Size Standard 2" x 2" up to 5" x 5"
- Fast switching between 3 wavelengths (i-Line (365 nm), h-Line (405 nm) and g-Line (435 nm) LEDs), 1.5% and better uniformity across 4" wafer
- Top side alignment / Top-Bottom sides alignment with IR substrate
- Microfluidics device, MEMS applications, High-aspect-ratio SU-8 resists