LPCVD
Manufacturer: First Nano
The First Nano EasyTube 6000 is a horizontal-tube furnace system, capable of processing 4" (100 mm) diameter silicon wafers. Three tubes are configured for low-pressure chemical-vapor deposition (LPCVD) of silicon dioxide, polysilicon, and silicon nitride. A cantilevered loading system with a horizontal HEPA laminar flow filter facilitates wafer loading and unloading with minimal particle generation. Each process tube is enclosed in a three-temperature-zone, resistance-heated furnace. A comprehensive process control computer permits use of custom deposition recipes and full automatic control of the entire deposition cycle.
Tube #1 Film: silicon nitride; Source Gases: SiH2CL2, NH3, N2
Tube #2 Film: Polysilicon; Source Gases: SiH4, N2
Tube #3 Film: None at this time; Source Gases: N2