Lesker ALD
Manufacturer: Kurt J. Lesker
The Lesker ALD150LX Atomic Layer Deposition (ALD) system is designed for R&D applications using their patented precursor focusing technology and advanced process capabilities. The tool's cluster technology eliminates unwanted atmosphere exposure between critical steps and analysis to protect sensitive layers and interfaces. Independent substrate heating, in-situ ellipsometry, four separate inlet ports, and temperature operation up to 500 °C. The system can process up to 150 mm diameter substrates.
Precursors: TDMAH, TDMAZ, TiCl4, TMA, and H2O (water)