GCA AutoStepper System
Manufacturer: GCA
The AutoStep 200 lithography system is a 5x reduction, production grade i-stepper with repeat exposure capabilities as large as 14.85 mm x 14.85 mm. The system uses a 700 W Hg arc lamp to produce 365 nm light at ~275 mW/cm2 intensity. The system features a fully automatic reticle management system (RMS) that loads/unloads with a built-in bar code scanner. The RMS system will automatically align to the stage that is housed in a climate-controlled system to eliminate system drift due to thermal instabilities. The system can process 4" wafers or samples as small as 10 mm x 10 mm. Manual wafer loading is achieved through one of several chucks that set the depth of focus for the exposure. The system can easily produce 0.5 μm isolated lines across the entire field using a wafer auto leveling system. Bi-weekly calibration of the stage ensures global alignment better than 0.3 μm for manual aligned wafers. Using the die x die, μ-DFAS local alignment system, alignment errors better than 0.10 μm are easily achieved.
Cleaning procedure: Samples generally do not require special cleaning unless needed to remove prohibited materials before processing. All materials to enter the equipment will be handled with wafer tongs by an operator wearing latex, poly, or nitrile clean gloves.
Operating Instructions
Allowed Materials
Semiconductor-based materials, dielectrics, metal films, and resists
Prohibited Materials
Organics, liquids of any type, and greases