Drytek Plasma Asher
Manufacturer: Drytek
Photoresist stripping (ashing) has been widely used as a dry method for the removal of photoresists and other carbon based materials. The Drytek Mega Strip 5 utilizes an exclusive passivation method, which produces a greater number of active species. The Drytek Mega Strip 5 standard process automatically controls gas flow, pressure and applied RF Power (1500 W). The frequency, typically set around 50 kHz, has been adjusted to optimize the maximum power to the electrodes.
Operating Instructions
Allowed Materials
Si, Ge, C, GaAs and its compounds, InP and its compounds, cleaned SiO2 (glass), and cleaned Al2O3 (sapphire)
Prohibited Materials
High vapor pressure metals including: indium, lead, tin, and zinc
Magnetic materials including: iron, nickel, and cobalt